RNDKOREA

Quartz Wafer: Quartz wafer는 높은 작업온도, 높은 항부식, 양호한 열전도율, 높은 광투과율과 같은 많은 독특한 특징을 가지고 있으며,
이 특징들은 Quartz 웨이퍼를 반도체, 포토마스크, 마이크로파 필터, 광섬유 응용에 사용되고 있다.

High working temperature	High optical transmission
High stability	High anti corrosion
Good thermal conductivity	low dielectric loss
Stable dielectric constant	Superior mechanical properties

Fused silica wafer ( Synthetic silica )	Fused quartz wafer ( Natual silica )
High OH content >1200	Low OH content > 150
Higher transmission in the UV range	Lower transmission in the UV range
Free bubbles and inclusions	Contain bubbles and inclusions
Very low fluorescence	High fluorescence
Impurity 5 ppm	Impurity 20 ~ 40 ppm

Chemical formula	SiO2
Mechanical Properties
Density	2.2 g / cm3
Poisson's ratio	0.14 ~ 0.17
Young's modulus	72000 Mpa
Rigidity modulus	31000 Mpa
Moh's hardness	5.5 ~ 6.5
Thermal Properties
Transformation point	1120 °C
Softening point	1680 °C
Specific heat ( 20 ~ 350 °C )	670 J / kg °C
Thermal conductivity ( 20 °C )	1.4 W / m °C
Thermal expansion coefficient	5.5×10 -7 cm / cm °C
Electrical Properties
Resistivity	7E7 ohm-cm
Insulating strength	250 ~ 400 Kv / cm
Dielectric constant e	3.7~ 3.9
Dielectric absorption coefficient.	< 4E4
Dielectric waste coefficient.	< 1E4
Optical Properties
Refractive index ( @ 589 nm )	Nd =1.4584

Growth	CVD / Oxy-Hydrogen melting / electric melting
Diameter	Ø 1" / Ø 2" / Ø 3" / Ø 4"/ Ø 6" / Ø 8"/ Ø 12"
Size	10 x 10 / 20 x 20 / 50 x 50 / 100 x 100 / 200 x 200 mm
Thickness	0.4 mm / 0.5 mm / 0.7 mm / 1 mm
Surface	one side polished / two sides polished
Flat	SEMI.Std. flat or Notch
TTV	<= 15 um
Roughness	Ra <= 10 A
Package	Ampak cassette / jar